§10.1Processing Near Memory

Part III Sze et al. pp. 242–245 · ~12 min read

  • memory wall
  • processing near memory
  • eDRAM
  • stacked memory (3-D memory)
  • TSV
  • monolithic 3-D integration

Chapter 3 ended with a fact that dominated every energy discussion since: data movement, not arithmetic, consumes the energy — both in accessing the memory and in transferring the data. The same physics limits the bandwidth between memory and compute, and with it the whole system’s throughput. Computer architects call this the memory wall (specifically: the wall between off-chip memory like DRAM and the processor). Where the full book’s Chapters 5–6 fight it architecturally — spatial architectures that scatter on-chip memory into the PEs — this chapter fights it with technology: advanced memory, process, and fabrication techniques that physically bring compute and memory together.

The chapter’s tour, in order of increasing radicalism:

  1. Processing near memory (this section) — keep the compute digital, move the high-density memory next to it: embedded DRAM, 3-D stacks.
  2. Processing in memory (§10.2) — move the compute into the memory array, accepting analog computation and its non-idealities.
  3. Processing in sensor (§10.3) — same idea aimed at the input side: compute where the data is captured.
  4. Processing in the optical domain (§10.4) — photons travel fast and (nearly) for free with distance.

Why off-chip memory is expensive — and what “near” buys

High-density memories typically need a different process technology than logic, so they’re fabricated as separate chips — and every access goes off-chip. Two physical limits follow:

  • I/O pads: a chip has only so many pins, capping the width of the data bus (bits per cycle).
  • Channel characteristics: the off-chip interconnect’s resistance, inductance, and capacitance limit signaling frequency — and its capacitance is exactly what Eq. 3.8 charges energy for.

Processing near memory overcomes both by shortening the wire: access energy falls with interconnect length (less capacitance), and bandwidth rises — primarily because a wider interconnect becomes possible (more bits per cycle, no pad limit), and secondarily because the shorter channel supports a higher clock.

Five ways to shorten the wire — the near-memory technology ladder (click blocks for internals)
PCB traces — I/O-pad-limited width, high CProcessor diePEs + on-chip bufferclick for detailsDRAM chipsseparate process, separate packageclick for details
Blocks with a dot open up — click one to look inside.

Table 10.1 — the systems, side by side

Tens of megabytes to gigabytes, at tens to thousands of GB/s — and note the Evaluation column: most of these results are simulated, not measured silicon (a §3.7 test-setup reporting point the book makes explicitly).

Table 10.1 — recent works exploring processing near memory
TechnologySizeI/OBandwidthEvaluation
DaDianNaoeDRAM32 MBon-chip18 ch × 310 GB/s = 5580 GB/sSimulated
NeurocubeStacked DRAM2 GBTSV16 ch × 10 GB/s = 160 GB/sSimulated
TetrisStacked DRAM2 GBTSV16 ch × 8 GB/s = 128 GB/sSimulated
QuestStacked SRAM96 MBTCI24 ch × 1.2 GB/s = 28.8 GB/sMeasured
N3XTmonolithic 3-D4 GBILV16 ch × 48 GB/s = 768 GB/sSimulated
Dotted-underlined cells have explanations — click one.

10.1.1 Embedded high-density memories

The first rung: fabricate the dense memory inside the logic die. eDRAM is the veteran — DaDianNao uses 16×2 MB eDRAM tiles for weights plus 2×2 MB for input/output activations, all accessible in parallel through 4096-bit rows for extreme bandwidth. Its costs: lower density than off-chip DRAM, higher fabrication cost, and reportedly slower scaling than SRAM — so its density edge erodes over generations. Embedded non-volatile memories (eFlash, MRAM, RRAM, PCRAM) have accordingly gained popularity: denser, non-volatile, and free of eDRAM’s refresh/leakage standby power.

The flexibility fine print (book footnote 2)

DaDianNao assumes the DNN model fits in its 32 MB of weight eDRAM. In practice that means either limiting supported model size or falling back to off-chip memory when models outgrow it — precisely the “efficiency built on an unguaranteed model property” risk that §3.5 warned about.

10.1.2 Stacked memory (3-D memory)

The second rung: keep memory and logic as separate dies, but stack them in one package (hence also “in-package memory”).

  • DRAM on logic via TSVs — commercialized as Hybrid Memory Cube (HMC) and High Bandwidth Memory (HBM). Order-of-magnitude bandwidth gain, up to 5× lower access energy than 2-D DRAM, because TSVs carry far less capacitance than off-chip interconnect. Neurocube gives each DRAM vault (vertically stacked banks) its own PE (buffer + MACs) and connects PEs with a 2-D mesh NoC — making where to place weights and activations across vaults the central design decision, since it sets NoC traffic. Tetris pairs HMC with the Eyeriss spatial architecture and its row-stationary dataflow , and — now that off-chip is cheap — allocates more area to PEs and less to the on-chip buffer, adapting the dataflow to match (the §3.2 area trade, re-decided under new physics).
  • SRAM on logic via stacking with TCIQuest stacks eight SRAM dies (96 MB) holding weights and intermediate activations for layer-by-layer processing; stacked SRAM offers ~10× lower latency than stacked DRAM. The dies communicate by ThruChip Interface (TCI): inductive-coupling die-to-die wireless links, cheaper to integrate than TSVs.
  • Monolithic 3-D integration — the frontier: fabricate thin layers of memory devices directly on top of logic, connected by interlayer vias (ILVs) with several orders of magnitude denser vertical connectivity than TSVs. N3XT combines on-chip NVM (RRAM, STT-MRAM/MRAM, PCRAM) with carbon-nanotube logic (CNFETs); simulations put ILV energy-delay up to two orders of magnitude below 2-D systems on DNN workloads (vs 8× for TSV) — with the biggest wins where data reuse is low (FC layers at small batch) and traffic across the vias is heaviest.
DRAM dies (stacked)a vault = vertical stack of bankslogic die (TSVs ↑)vaults feed PEs over a 2-D mesh NoCvault 0bufferMAC MACMAC MACvault 1bufferMAC MACMAC MACvault 2bufferMAC MACMAC MACvault 3bufferMAC MACMAC MACPE per vault (Neurocube): the mesh lets any PE reach any vault —so data placement across vaults decides how much traffic the NoC carriesQuest variant: 8 SRAM dies, 24 vaults,TCI inductive links instead of TSVs

Figure 10.1, distilled: vaults (vertical bank stacks) drop straight down into per-vault processing engines; a mesh NoC covers the cases where a PE needs another vault’s data.

What near-memory changes for the architect

The book closes the section with the systems-level punchline: the new memories are faster but smaller, so the optimal mappings change — and with them a chain of design decisions:

  • data allocation — access patterns are constrained (banks in DRAM, vaults in stacks), so where each tensor lives matters;
  • NoC design between memory and PEs;
  • area split between on-chip memory and compute, now that off-chip communication is cheap (Tetris chose more PEs, smaller buffer);
  • memory hierarchy and dataflow, re-optimized for the new movement costs.

Design takeaway

Near-memory processing doesn’t remove the memory wall — it relocates it, and re-prices every trade-off from §3.2–3.4. Evaluate claims accordingly: check the Evaluation column (simulated vs measured), and ask how the design maps models that don’t fit its shiny new memory.

Check yourself

Check yourself — Processing Near Memory

1.What exactly is the 'memory wall' that this chapter attacks?

2.How does processing near memory reduce access energy AND raise bandwidth at the same time?

3.DaDianNao stores all weights in 32 MB of on-chip eDRAM. Per the book (and §3.5), what is the flexibility catch?

4.Rank the vertical-connection technologies by density of connectivity (sparsest → densest).

5.Predict the architectural consequence the book closes 10.1 with: the new near-memories are faster but smaller than off-chip DRAM. What must change?

5 questions